IEC/TS 62607-6-8 Ed. 1.0 en:2023 PDF

IEC/TS 62607-6-8 Ed. 1.0 en:2023 PDF

Name:
IEC/TS 62607-6-8 Ed. 1.0 en:2023 PDF

Published Date:
06/01/2023

Status:
Active

Description:

Nanomanufacturing – Key control characteristics – Part 6-8: Graphene – Sheet resistance: In-line four-point probe IEC

Publisher:
International Electrotechnical Commission - Technical Standard

Document status:
Active

Format:
Electronic (PDF)

Delivery time:
10 minutes

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200 business days

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This part of IEC TS 62607 establishes a method to determine the key control characteristic
• sheet resistance RS [measured in ohm per square (Ω/sq)],
by the
• in-line four-point probe method, 4PP.
The sheet resistance RS is derived by measurements of four-terminal electrical resistance performed on four electrodes placed on the surface of the planar sample.
• The measurement range for RS of the graphene samples with the method described in this document goes from 10−2 Ω/sq to 104 Ω/sq.
• The method is applicable for CVD graphene provided it is transferred to quartz substrates or other insulating materials (quartz, SiO2 on Si, as well as graphene grown from silicon carbide.
• The method is complementary to the van der Pauw method (IEC 62607-6-7) for what concerns the measurement of the sheet resistance and can be useful when it is not possible to reliably place contacts on the sample boundary.


Edition : 1.0
File Size : 1 file , 920 KB
ISBN(s) : 9782832271131
Note : This product is unavailable in Canada
Number of Pages : 26
Published : 06/01/2023

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